27-33

FORMATION OF NANO STRUCTURES IN RESULT OF HOMOGENOUS NUCLEATION OF CARBON OBTAINED IN THERMAL PLASMA UNDER ATMOSPHERIC PRESSURE

Thermal plasma processing of carbon sources using a plasma jet with high heat ca-pacity is one of the most promising methods for the synthesis of new materials. This paper describes the low-temperature deposition of carbon nanomaterials by remote plasma-enhanced chemical vapor deposition (PECVD) in the absence of catalysts. The remote PECVD process differs from conventional and direct PECVD process in two ways: (a) only a subset of the process reactants and/or diluents are directly plasma excited; and (b) thin film deposition takes place on a substrate that is outside of the plasma glow region. In conven-tional CVD methods, carbon is produced from the decomposition of carbon sources such as hydrocarbons, carbon monoxide, alcohols, and so on, over a metal catalyst. The unavoidable metal species remaining in carbon nanomaterials would lead to obvious disadvantages for property characterization and application exploration.

2016, Т. 59, № 8, Стр. 27-33